PureFize Presents Field-emission Cathodoluminescent Approach for Next-generation Far-UVC Devices

PureFize Technologies AB, a Swedish developer and producer of broad-spectrum UV technology, today announced that it has presented new results at ICFUST 2026 demonstrating the feasibility of generating Far-UVC emission below 240 nm using the company’s field-emission and cathodoluminescence technology platform.

The presentation, delivered by Dr Emma Eriksson, R&D, PureFize Technologies AB, introduced a new deep-UV radiation source concept that combines field emission from ZnO nanostructures with cathodoluminescent excitation of a Far-UVC phosphor layer. The approach represents a potentially important new direction in Far-UVC device development, complementing existing gas-discharge and semiconductor-based technologies.

Far-UVC is attracting increasing scientific and commercial interest because of its potential to inactivate microorganisms in air and on surfaces while offering a fundamentally different tissue interaction profile compared with longer-wavelength germicidal UVC. However, broad market adoption will require technologies that can deliver the right combination of wavelengths, stability, manufacturability, cost, integration flexibility, and application-specific performance.

PureFize’s demonstrated concept is based on the company’s established field-emission/cathodoluminescence platform. In the device, electrons are emitted from a nanostructured cathode and accelerated toward a phosphor-coated surface. When the electrons interact with the phosphor material, emission is generated through cathodoluminescence. By changing the phosphor material, the emission spectrum can be engineered for different UV ranges and applications.

“Far-UVC is one of the most exciting areas in UV technology, but the field still needs new device platforms to support real-world adoption,” said Fredrik Forssell, CCO and Head of Business Development at PureFize Technologies. “Our results show that PureFize’s core technology is not limited to our current broad-spectrum UV products. It can also be directed toward Far-UVC, opening a path toward scalable, flexible and potentially application-specific device designs.”

The development work presented at ICFUST 2026 includes Far-UVC phosphor investigations performed in collaboration with FH Münster University of Applied Sciences, Department of Chemical Engineering, including work with Sc-doped and Pr-doped phosphor materials.

Early prototype characterization presented by PureFize showed:

• Deep-UV emission below 240 nm

• Tunable output power

• Wide-angle emission of approximately 100°

• Short start-up time

• Irradiance stability across a wide ambient temperature range

• Measured irradiance of approximately 3.5 µW/cm² at 1 m with 12 W total input power

PureFize emphasized that the work represents a technology milestone rather than a commercial product launch. The company’s next development steps include continued material development, spectrum optimization, system-level performance improvement, application tuning, and safety validation.

“Because our platform separates the electron-generation mechanism from the emitting phosphor material, it gives us a high degree of design flexibility,” said Dr Emma Eriksson. “This flexibility is particularly relevant for Far-UVC, where wavelength, spectral purity, optical output, thermal behavior, and application geometry all matter.”

PureFize’s existing broad spectrum UV product platform is already built around field emission and cathodoluminescence, using a scalable production approach developed and implemented at the company’s facility in Uppsala, Sweden. The company’s current broad-spectrum UV technology emits primarily in the UVC range, with additional UVB and UVA components, and is being developed for applications where microbial control, food safety, quality, and shelf-life extension are critical.

With the new Far-UVC results, PureFize sees an opportunity to expand the role of its platform into next-generation UV disinfection systems.

“Far-UVC has enormous potential, but no single device architecture will solve every application,” added Forssell. “We believe our technology can become an important product platform — especially where scalability, spectrum tuning, robust operation, and system integration are decisive.”